Method and apparatus for examining features on...

Optics: measuring and testing – Dimension

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S636000

Reexamination Certificate

active

06891628

ABSTRACT:
An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. The response light is reflected light, transmitted light or a combination of the two. The complex-valued response typically includes a complex reflectance amplitude, a complex transmittance amplitude or both. The apparatus and method take into account the effects of vertical and lateral coherence length and are well suited for examining adjacent features.

REFERENCES:
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 4850711 (1989-07-01), Sano et al.
patent: 4866782 (1989-09-01), Sugie et al.
patent: 5061072 (1991-10-01), Folkard et al.
patent: 5184021 (1993-02-01), Smith
patent: 5363171 (1994-11-01), Mack
patent: 5452091 (1995-09-01), Johnson
patent: 5607800 (1997-03-01), Ziger
patent: 5739909 (1998-04-01), Blayo et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6340602 (2002-01-01), Johnson et al.
patent: 6426644 (2002-07-01), Borden et al.
patent: 6483580 (2002-11-01), Xu et al.
Chopra, K.L., Thin Film Phenomena, p. 99 (McGraw Hill).
Cynthia B. Brooks, et al., “Process Monitoring of Etched Fused Silica Phase Shift Reticles”, Proceedings of the SPI, 22ndAnnual BACUS Symposium of Technology and Management, Sep. 30-Oct. 4, 2002, Monterey, CA, USA.
Alessandro Callegari and Katerina Babich, “Optical Characterization of Attenuated Phase Shifter”, SPIE, vol. 3050, pp. 504-517.
Pieter Burggraff, “Lithography's Leading Edge, Part 1: Phase Shift Technology”, Feb. 1992, pp. 43-47.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for examining features on... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for examining features on..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for examining features on... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3448970

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.