Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1990-02-16
1992-03-17
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20429841, 427 37, 118723, C23C 1422, B05D 314
Patent
active
050965581
ABSTRACT:
A method for evaporating materials in a vacuum chamber by heating a material to be evaporated by the impact of electrons generated in a vacuum arc discharge ignited and sustained between a cold cathode and an anode, comprises the steps of locating the cathode and the anode in a vacuum chamber, connecting the material to be evaporated to at least a part of the anode in the evaporation chamber, generating electrons for a self-sustained discharge in the cathode spots on the cold cathode-surface, bombarding the anode with electrons generated in the arc discharge to obtain on the surface of the anode a power input sufficient for the evaporation of the material, and maintaining the arc discharge essentially in the vapor of the material evaporated at the anode. An apparatus for performing the method includes a vacuum evaporation chamber, in which the cold cathode and the anode, both provided with cooling means are positioned opposite to each other and the material to be evaporated is provided at the end of the anode, facing the cathode.
REFERENCES:
patent: 3562141 (1971-02-01), Morley
patent: 3751310 (1973-11-01), Cho
patent: 3756193 (1973-12-01), Carmichael
patent: 4197175 (1980-04-01), Moll et al.
patent: 4254159 (1981-03-01), Pulker et al.
patent: 4342631 (1982-08-01), White et al.
patent: 4346123 (1982-08-01), Kaufman
patent: 4407712 (1983-10-01), Henshaw et al.
patent: 4415421 (1983-11-01), Sasanuma
patent: 4448802 (1984-05-01), Buhl et al.
patent: 4461689 (1984-07-01), Diepers
patent: 4468309 (1984-08-01), White
patent: 4492845 (1985-01-01), Kljuchko et al.
patent: 4540868 (1985-10-01), Liebing
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4563262 (1986-01-01), Sablev et al.
Vasin et al., "Vacuum Arc with a Distributed Discharge on an Expendable Cathode", Sov. Tech. Phys. Lett., 5(12), (1979).
A. M. Dorodnov et al., "New-Anode Vapor Vacuum Arc with Permanent Hollow Cathode", Sov. Phys. Letters, 5(8) (1979).
A. M. Dorodnov et al., "Physical Principles and Types of Technological Vacuum Plasma Devices", Sov. Phys. Tech. Phys. 26(3) (1981).
Chemistry and Industri, Nr. 7, 3. Apr. 1976, Seiten 316, 317, The Chemical Society, Letch Worth, Herts, GB; A. J. Wickens: "Formation of Boron Carbide in a High-Intensity Arc Plasma".
E. Gebauer, "Phenomena at the Electrodes of an Arc Discharge in the Pressure Range 10.sup.-6 to 760 Torr", Elektrie, vol. 28, pp. 473-475, 1974.
Gebauer, "Investigations to the Electrode Erosion in Vacuum in the Transition Region Between Both the Typical Kinds of Vacuum Arcs", Proc. Eighth Int. Conf. Electr. Contact Phen., 1976, p. 183.
A. S. Gilmour, Jr., "Pulsed Metallic-Plasma Generators", Aug. 8, 1972, pp. 977-991.
Klapas et al., "Anode Spot Temperatures in Vacuum Arcs", Eleventh International Conference on Phenomena in Ionized Gases, 1973, praque, Czechoslovakia, Sep., 1973, p. 82.
Kutzner, "Voltage-Current Characteristics of a Diffusion Vacuum Arc", Physics, 104E (1981), p. 116.
Miller, "Vacuum Arc Anode Phenomena", IEEE Transactions on Plasma Science, vol. ps-5, No. 3, Sep. 1977, p. 181.
John W. Northrip, "Experimental Study of Arc Stability I", pp. 2296-2304.
Sovient Inventions Illustrated, Week J 48, veroffentlicht 19, Jan. 1983; & SU-A-901 357.
Dorodnov et al., "Physical . . . Devices", Sov. Phys. Tech. Phys. 26(3), 3/81, pp. 304-315.
Miller, "Vacuum Arc Anode Phenomena", IEEE Trans. on Plasma Science, PS-11, No. 2, 6/83, pp. 76-89.
Miller, "Vacuum Arc Anode Phenomena", IEEE Trans. on Plasma Science, PS 5, No. 3, 9/77, pp. 181-196.
Kimblin, "Anode . . . Arcs", J. Appl. Phys., vol. 40, No. 4, Mar. 1969, p. 1744.
Dorodnov et al., "New Anode . . . Cathode", Sov. Phys. Tech. Phys. 5(8), 8/79, pp. 418-419.
Nguyen Nam X.
Plasco Dr. Ehrich Plasma - Coating GmbH
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