Fishing – trapping – and vermin destroying
Patent
1994-04-05
1995-11-07
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
148DIG162, H01L 2166
Patent
active
054647797
ABSTRACT:
The method and apparatus of this invention for evaluation of a semiconductor production process effect the determination of the shallow pit density of a silicon wafer by predetermining the correlation between the average shallow pit density on a wafer surface obtained by microscopic observation and the average magnitude of a scattered light on the wafer surface obtained by the determination with the wafer surface inspection system operated in the haze mode, determining the average magnitude on the wafer surface of a scattered light for a silicon wafer treated by a semiconductor production process under evaluation, and analyzing the data found by the determination in combination with the correlation mentioned above. Thus, they bring about an effect of enabling the determination to be carried out automatically and quickly and exalting the accuracy of determination and allowing a generous cut in the time required for the determination as compared with the conventional determination resorting to visual measurement and evaluation.
REFERENCES:
patent: 4194127 (1980-03-01), Schmidt
patent: 4378159 (1983-03-01), Galbraith
patent: 4899055 (1990-02-01), Adams
patent: 4925298 (1990-05-01), Dobrilla
patent: 4963500 (1990-10-01), Cogan et al.
patent: 5198869 (1993-03-01), Monteverde et al.
patent: 5233191 (1993-08-01), Noguchi et al.
Patent Abstracts of Japan, v16, N554 (E-1293), 25 Nov. 1992, Semiconductor Substrate, Manufacture of Semiconductor Substrate and Semiconductor . . . .
Patent Abstract of Japan, V16, N385 (E-1249), 17 Aug. 1992, Estimation Method of Semiconductor Substrate.
Jrnl of Crystal Growth, V114, N1/2, 1991 pp. 64-70, Detection and Characterisation of Microdefects and Microprecipitates in Si Wafers . . . .
Patent Abstracts of Japan, V17, N121, (E-1331), 12 Mar. 1993, Method and Device for Evaluating Semiconductor Substrate.
Chaudhuri Olik
Mulpuri S.
Shin-Etsu Handotai & Co., Ltd.
Snider Ronald R.
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