Method and apparatus for etching integrated optoelectronic devic

Details Method and apparatus for etching integrated optoelectronic devic Method and apparatus for etching integrated optoelectronic devic

1985-11-18

1987-06-23

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412965, 204224M, C25F 312, C25F 700

Patent

active

046750860

ABSTRACT:
Optoelectronic devices are produced as integrated chips which include elements to control optical signals and electronic elements to control the optical elements. An integrated chip includes optical wave guides with tapered ends to facilitate exit and entry of optical signals. The tapered ends are produced by photo-electrolytic etch using illumination of graded intensity, e.g. the penumbra of a shadow.

REFERENCES:
patent: 4303482 (1981-12-01), Buhne et al.
patent: 4391683 (1983-07-01), Buckley et al.
patent: 4415414 (1983-11-01), Burton et al.
patent: 4482443 (1984-11-01), Bacon et al.
patent: 4576691 (1986-03-01), Kohl et al.

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