Method and apparatus for enhancing the focus latitude in lithogr

Details Method and apparatus for enhancing the focus latitude in lithogr Method and apparatus for enhancing the focus latitude in lithogr

1993-03-31

1994-04-12

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, 355 77, 430311, G03B 2742

Patent

active

053030028

ABSTRACT:
A method and apparatus for patterning a photoresist layer, with an enhanced depth of focus, is disclosed. The photoresist layer is exposed in a projection system which includes a lens having a chromatic aberration coefficient. Several closely spaced, narrow bands of radiation from an excimer are used to irradiate a mask. Each band is focused on the photoresist layer at a different focal plane along the light axis, thereby providing an increased depth of focus in a single exposure.

REFERENCES:
patent: 4853756 (1989-08-01), Matsuki
patent: 4869999 (1989-09-01), Fukuda et al.
patent: 4904569 (1990-02-01), Fukuda et al.
patent: 4937619 (1990-06-01), Fukuda et al.
patent: 5001038 (1991-03-01), Dorinski et al.
patent: 5091744 (1992-02-01), Omata
patent: 5202275 (1993-04-01), Sugiura et al.
-H. Fukuda, N. Hasegawa, and S. Okazaki, "Improvement of Defocus Tolerance in a Half-Micron Optical Lithography by the Focus Latitude Enhancement Exposure Method: Simulation and Experiment," J. Vac. Sci. Technol. B7(4), pp. 667-674 (Jul./Aug. 1989).
-H. Fukuda, N. Hasegawa, T. Tanaka, and T. Hayashida, "A New Method for Enhancing Focus Latitude in Optical Lithography: FLEX," IEEE Electron Device Letters, vol. EDL-8, No. 4, pp. 179-180 (Apr. 1987).

Affiliated with

Also associated with

Rating

Method and apparatus for enhancing the focus latitude in lithogr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for enhancing the focus latitude in lithogr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for enhancing the focus latitude in lithogr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2102559