Plant husbandry – Electroculture – magnetoculture or electrocuting
Patent
1996-09-18
1998-04-21
Fox, David T.
Plant husbandry
Electroculture, magnetoculture or electrocuting
47 58, A01C 100, A01G 704, A01B 7900
Patent
active
057406278
ABSTRACT:
A method and apparatus for treating seeds with self-organized avalanches of electrons between electrodes (11, 12) as a cathode and an anode with seeds (13) between the anode and cathode or on the anode. Apparatus circuit (200) in a box (20) provides simultaneous DC and AC between the electrodes which creates the avalanche of electrons which project into the seeds. The seeds must be stored before planting. The seeds so treated have enhanced growth characteristics.
REFERENCES:
patent: 2308204 (1943-01-01), Parry
patent: 2712713 (1955-07-01), Jonas
patent: 3675367 (1972-07-01), Amburn
patent: 3703051 (1972-11-01), Weinberger
patent: 3765125 (1973-10-01), Amburn
patent: 3822505 (1974-07-01), Levengood
patent: 3852914 (1974-12-01), Levengood
patent: 3940885 (1976-03-01), Gray
patent: 4188751 (1980-02-01), Saruwatari
patent: 4633611 (1987-01-01), Schiller et al.
patent: 4758318 (1988-07-01), Yoshida
patent: 5077934 (1992-01-01), Liboff et al.
patent: 5117579 (1992-06-01), Tellefson
patent: 5288626 (1994-02-01), Levengood
Levengood, W.C., Bioelectrochemistry and Bioenergetics, 225-239 (1991).
Allen and Balin, "Free Radical Biology and Medicine", vol. 6, pp. 631-661 (1989).
Raether, H., Electron Avalanches and Breakdown in Gases, Butterworth & Co. Ltd., U.K. 1964 pp. 90-93.
Burke John A.
Levengood William C.
Bell Kent L.
Fox David T.
McLeod Ian C.
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