Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-03-21
2006-03-21
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S322000
Reexamination Certificate
active
07014966
ABSTRACT:
A method of operating an immersion lithography system, including steps of immersing at least a portion of a wafer to be exposed in an immersion medium, wherein the immersion medium comprises at least one bubble; directing an ultrasonic wave through at least a portion of the immersion medium to disrupt and/or dissipate the at least one bubble; and exposing the wafer with an exposure pattern by passing electromagnetic radiation through the immersion medium subsequent to the directing. Also disclosed is a monitoring and control system for an immersion lithography system.
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Abdo Amr Y.
Amblard Gilles R.
LaFontaine Bruno M.
Lalovic Ivan
Levinson Harry J.
Advanced Micro Devices , Inc.
Duda Kathleen
Renner , Otto, Boisselle & Sklar, LLP
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