Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Reexamination Certificate
2008-04-22
2008-04-22
Hiteshew, Felisa (Department: 1792)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
C117S200000, C117S900000
Reexamination Certificate
active
11190462
ABSTRACT:
A method for eliminating a display defect in a liquid crystal display device includes disposing a liquid crystal panel adhered with a polarizer into a first buffer chamber, increasing pressure of the first buffer chamber, communicating the first buffer chamber with a reactor chamber having a predetermined pressure, transferring the liquid crystal panel from the first buffer chamber to the reactor chamber, increasing pressure of a second buffer chamber, communicating the second buffer chamber with the reactor chamber, and transferring the liquid crystal panel from the reactor chamber to the second buffer chamber.
REFERENCES:
patent: 6020867 (2000-02-01), Shimada et al.
Her Seung-Hee
Kim Jin-Whal
Lee Kun-Jong
Om Tai-Huem
Won Min-Young
LandOfFree
Method and apparatus for eliminating a display defect in a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for eliminating a display defect in a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for eliminating a display defect in a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3903870