Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system
Reexamination Certificate
2007-08-28
2007-08-28
Barlow, John (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Mechanical measurement system
C118S7230MW
Reexamination Certificate
active
10495864
ABSTRACT:
An equipment status monitoring system and method of operating thereof is described. The equipment status monitoring system includes at least one microwave mirror in a plasma processing chamber forming a multi-modal resonator. A power source is coupled to a mirror and configured to produce an excitation signal extending along an axis generally perpendicular to a substrate. A detector is coupled to a mirror and configured to measure an excitation signal. A control system is connected to the detector that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment.
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Verdeyen, J. T., Johnson, W. L., Sirkis, M. D., “Electron Density Measurement and Plasma Process Control System Using a Microwave Oscillator Locked to an Open Resonator Containing the Plasma,” WIPO, WO 01/06402 A1, Jan. 25, 2001, all pages.
Barlow John
Sievers Lisa
Tokyo Electron Limited
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