Method and apparatus for electron beam alignment with a member b

Details Method and apparatus for electron beam alignment with a member b Method and apparatus for electron beam alignment with a member b

1974-07-18

1977-02-15

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

219121EM, 250397, 313471, H01J 2950, H01J 3149

Patent

active

040084027

ABSTRACT:
A method and apparatus are provided for alignment of an electron beam with precisely located areas of a major surface of a member. Marks of predetermined shape are formed of X-ray producing material and are positioned adjacent the major surface of the member which is preferably substantially transparent to the X-rays generated by the marks. An electron beam to be aligned has at least one alignment beam portion of a predetermined cross-sectional shape and preferably corresponds in dimensional accuracy to the alignment accuracy desired. The X-ray emissions are detected by a detector means preferably positioned adjacent the opposite surface of the member. The position of the electron beam is moved relative to the member while continuing said detection until the X-ray emissions detected indicate alignment of the alignment beam portion with a corresponding mark. Preferably, said alignment method is used in producing a very accurate component pattern in an electroresist layer supported by a member utilizing either a scanning electron beam or an electron image projection system for the electron radiation beam.

REFERENCES:
patent: 3081414 (1963-03-01), Goodman
patent: 3691424 (1972-09-01), Goodman
patent: 3840749 (1974-10-01), O'Keeffe et al.
patent: 3842279 (1974-10-01), Schumacher

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