Method and apparatus for efficiently heating semiconductor wafer

Details Method and apparatus for efficiently heating semiconductor wafer Method and apparatus for efficiently heating semiconductor wafer

1997-02-12

1999-09-21

Paschall, Mark H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

219483, 219494, 118725, 392416, H05B 102, H01L 2120

Patent

active

059549823

ABSTRACT:
A method and apparatus for efficiently heating for instance a semiconductor wafer or reticle substrate in either vacuum or air, by exposing the wafer or reticle to radiation whose spectrum is such that it includes only wavelengths which have been determined to be efficiently absorbed by the material of the wafer or reticle. This advantageously allows more rapid and uniform heating than is allowed by prior art broadband radiation, convection heating, or conduction. The wavelength and bandwidth of the radiation are selected to be those wavelengths efficiently absorbed by the wafer or reticle, depending on its particular material and thickness. Typical applications are to a wafer or reticle located in a vacuum where convection or conduction heating are inconvenient or absent.

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