Method and apparatus for drying wafers

Details Method and apparatus for drying wafers Method and apparatus for drying wafers

1980-05-01

1982-02-02

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 58, 34236, 198344, 269902, 269903, F26B 508

Patent

active

043132669

ABSTRACT:
A method and apparatus for drying a wafer at a drying station includes a wafer holder which grips the wafer on its edge so that there is no contact with a face of the wafer. This eliminates contact areas which could cause stains on the face. A carriage mechanism brings a wet wafer into the drying station at one level and takes the dry wafer out of the drying station at a different level to prevent any contact between the dry wafer and residual moisture at the incoming level.

REFERENCES:
patent: 3645581 (1972-02-01), Lasch, Jr. et al.
patent: 3812947 (1974-05-01), Nygaard
patent: 4236851 (1980-12-01), Szasz

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