Method and apparatus for dry process fluxing

Details Method and apparatus for dry process fluxing Method and apparatus for dry process fluxing

1993-10-15

1995-07-18

Dang, Thi

Etching a substrate: processes

Forming or treating electrical conductor article

156345, 134 1, 134 2, 427310, 427328, 216 67, 216 76, H05H 100, C23G 500

Patent

active

054338204

ABSTRACT:
In a method of dry process fluxing at least one surface of a metallic article, the surface to be fluxed is treated with a plasma at atmospheric pressure of a gaseous mixture comprising hydrogen and optionally at least one inert gas. The invention also concerns an apparatus, particularly for practicing the process, as well as a process for soldering or plating.

REFERENCES:
patent: 4436761 (1984-03-01), Hayashi et al.
patent: 4983255 (1991-01-01), Gruenwald et al.
patent: 5000819 (1991-03-01), Pedder et al.
patent: 5041304 (1991-08-01), Kusano et al.
patent: 5185132 (1993-02-01), Horiike et al.
patent: 5193739 (1993-03-01), Liedke et al.
patent: 5225659 (1993-07-01), Kusano et al.
patent: 5286532 (1994-02-01), Yoshikawa et al.

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