Method and apparatus for developing resist film including a mova

Details Method and apparatus for developing resist film including a mova Method and apparatus for developing resist film including a mova

1983-10-25

1986-01-14

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354325, 134144, 134153, 118321, G03D 504, B08B 302

Patent

active

045642800

ABSTRACT:
An apparatus for developing a resist film coated on a rotatable base plate, comprising means for supporting and rotating the base plate and nozzle means for feeding a developer onto the resist film. The nozzle means comprises a nozzle arm extending over the base plate and having a plurality of nozzles arranged along the length of the nozzle arm. Disclosed also is a method for developing a resist film coated on a rotatable base plate with a developer fed from a plurality of nozzles arranged on a nozzle arm along the length of the nozzle arm. The method comprises feeding the developer from th respective nozzles onto the resist film while rotating the base plate and while scanning the nozzle arm over the resist film.

REFERENCES:
patent: 2376591 (1945-10-01), Campbell
patent: 3769992 (1973-11-01), Wallestad
patent: 4416213 (1983-11-01), Sakiya
Patents Abstracts of Japan, vol. 6, No. 100 (P-121) (1978) Jun. 9, 1982.
Patents Abstracts of Japan, vol. 5, No. 110 (P-71) (782) Jul. 17, 1981.
Patents Abstracts of Japan, vol. 7, No. 90 (P-191) (1235), Apr. 14, 1983.
Patents Abstracts of Japan, vol. 7, No. 41 (P-177) (1187), Feb. 19, 1983.

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