Method and apparatus for developing resist

Details Method and apparatus for developing resist Method and apparatus for developing resist

1995-07-03

1996-11-05

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430325, 430326, 430311, 430331, 396571, 396626, G03F 730

Patent

active

055716440

ABSTRACT:
A resist developing apparatus has a plurality of developing solution containers each provided with a temperature regulator, a mixture tank connected to the plurality of developing solution containers, a flow control valve connected between the mixture tank and each developing solution container, a temperature detector for detecting the temperature of developing solution in the mixture tank, and a control system for controlling the flow control valve in accordance with the temperature detected by the temperature detector. As the development progresses, the temperature of the developing solution is lowered to stop the development. Thereafter, the developing solution is supplanted by rinsing solution.

REFERENCES:
patent: 4982215 (1991-01-01), Matsuoka

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