Method and apparatus for developing resist

Details Method and apparatus for developing resist Method and apparatus for developing resist

1996-06-21

1997-07-29

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396626, 430 30, 430325, G03D 500

Patent

active

056529384

ABSTRACT:
A resist developing apparatus has a plurality of developing solution containers each provided with a temperature regulator, a mixture tank connected to the plurality of developing solution containers, a flow control valve connected between the mixture tank and each developing solution container, a temperature detector for detecting the temperature of developing solution in the mixture tank, and a control system for controlling the flow control valve in accordance with the temperature detected by the temperature detector. As the development progresses, the temperature of the developing solution is lowered to stop the development. Thereafter, the developing solution is supplanted by rinsing solution.

REFERENCES:
patent: 4982215 (1991-01-01), Matsuoka

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