Method and apparatus for determining real gas effects in critica

Measuring and testing – Instrument proving or calibrating – Volume of flow – speed of flow – volume rate of flow – or mass...

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73196, G01F 2500

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active

047064927

ABSTRACT:
A method and apparatus for determining the gas flow rate in a high pressure critical flow nozzle is disclosed. A high pressure gas flows through a first critical flow nozzle. Upstream of the first critical flow nozzle a small slip-stream of gas is removed and flows through a smaller second critical flow nozzle. The small second critical flow nozzle drops the pressure of the gas to a low level. This flow rate of this low pressure gas stream is measured in a highly accurate low pressure gas flow rate measuring device. Since the flow rate in this device must be the same as that of the second critical flow nozzle, a correction factor can be calculated for the second critical flow nozzle. This flow rate correction factor will be the same for the first critical flow nozzle.

REFERENCES:
patent: 3469442 (1969-09-01), Brueckner
patent: 3604254 (1971-09-01), Sabuda
patent: 3741009 (1973-06-01), Bordeaux
patent: 3750472 (1973-08-01), Docousset
patent: 4027523 (1977-06-01), St. Clair
patent: 4122707 (1978-10-01), Leunig
patent: 4590790 (1986-05-01), Hicks et al.
"Tables of Critical Flow Functions and Thermodynamic Properties for Methane and Computational Procedures for both Methane and Natural Gas"; NASA Special Report, NASA SP-3074, 174 pages, Robert C. Johnson, published 1972.
"An Accurate Gas Metering System for Laminar Flow Studies"; The Review of Scientific Instruments, vol. 20, No. 1, pp. 61-66; Jan. 1949; J. W. Andersen et al.

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