Method and apparatus for determining plasma impedance

Details Method and apparatus for determining plasma impedance Method and apparatus for determining plasma impedance

2006-03-21

2006-03-21

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410, C219S121570, C118S7230IR, C156S345480, C156S345280

Reexamination Certificate

active

07015414

ABSTRACT:
A plasma processing system, method, and computer readable medium for measuring plasma impedance. The system includes a chamber configured to contain a plasma and including a chuck within an interior area of the chamber, the chuck including a support surface and a bottom surface, and a first voltage-current probe positioned at a first position located exterior to the chamber and on a radio-frequency transmission line between the chamber and a power source. The system also includes a simulation module connected to the first voltage-current probe and arranged to solve, based on measurements transmitted from the first voltage-current probe, a radio-frequency model of the radio-frequency transmission line between the first position and a second position located within the chamber.

REFERENCES:
patent: 6447636 (2002-09-01), Qian et al.
patent: 6592710 (2003-07-01), Benjamin et al.
patent: 6853953 (2005-02-01), Brcka et al.
patent: 6858112 (2005-02-01), Flamm et al.
patent: 6884635 (2005-04-01), Parsons
patent: 6887339 (2005-05-01), Goodman et al.

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