Method and apparatus for determining electromagnetic...

Details Method and apparatus for determining electromagnetic... Method and apparatus for determining electromagnetic...

2005-04-05

2005-04-05

Whitmore, Stacy A. (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

Reexamination Certificate

active

06875622

ABSTRACT:
A method for determining electromagnetic properties of a process layer includes providing a wafer having a grating structure and a process layer formed over the grating structure. The thickness of the process layer is measured. At least a portion of the process layer and the grating structure is illuminated with a light source. Light reflected from the illuminated portion of the grating structure and the process layer is measured to generate a reflection profile. An electromagnetic property of the process layer is determined based on the measured thickness and the reflection profile.

REFERENCES:
patent: 6051348 (2000-04-01), Marinaro et al.
patent: 6245584 (2001-06-01), Marinaro et al.
patent: 6433878 (2002-08-01), Niu et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 6673637 (2004-01-01), Wack et al.
patent: 20020135781 (2002-09-01), Singh et al.

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