Method and apparatus for detecting the position of a substrate h

Details Method and apparatus for detecting the position of a substrate h Method and apparatus for detecting the position of a substrate h

1992-03-27

1995-05-23

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

054186137

ABSTRACT:
A method of detecting a position of the substrate with respect to a particular direction, wherein the substrate has first and second patterns of different sizes in the particular direction and has a surface layer formed thereon includes the steps of detecting the first and second patterns to produce first and second data related to the position of the substrate; and predicting, by using the first and second data and the sizes of the first and second patterns in the particular direction, the position of the substrate as determined when the pattern size in the particular direction is sufficiently small.

REFERENCES:
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 4886974 (1989-12-01), Ina
patent: 4906852 (1990-03-01), Nakata et al.
patent: 4955062 (1990-09-01), Terui
patent: 4962318 (1990-10-01), Nishi
patent: 4971444 (1990-11-01), Kato
patent: 5028797 (1991-07-01), Abe et al.
"Nanometer Position Detecting Method Based on Holograph Method", Yamashita et al., 1990 Autumn, The Japanese Society of Applied Physics, Abstract, 27-ZG-16.
"Optical Heterodyne Alignment For Projection Exposure Apparatus", Magome et al, 1989 Autumn, The Japanese Society of Applied Physics, Abstract, 29a-L-2.
"Fundamentals of topographic substrate leveling", L. E. Stillwagon et al, SPIE vol. 920, Advances in Resist Technology and Processing V (1988), pp. 312-320.

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