Method and apparatus for detecting faults in transparent...

Optics: measuring and testing – Inspection of flaws or impurities – Transparent or translucent material

Reexamination Certificate

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Reexamination Certificate

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10812161

ABSTRACT:
The method for detecting faults in transparent material includes irradiating a definite partial volume in the material with a first radiation source and coupling light into the material from a second source so that its optical path in the partial volume extends in the interior of the material. A fault in the partial volume is detected by light scattering, bright field absorption, and/or deflection of light of the first radiation source by the fault. The apparatus for detecting faults includes a first radiation source for illuminating a definite partial volume of the material, a detector for detecting light from this partial volume, and a second radiation source. The second radiation source is arranged in relation to the material so that the associated optical path in the partial volume passes exclusively in the interior of the material.

REFERENCES:
patent: 4492477 (1985-01-01), Leser
patent: 4725139 (1988-02-01), Hack et al.
patent: 4808813 (1989-02-01), Champetier
patent: 5790247 (1998-08-01), Henley et al.
patent: 6151125 (2000-11-01), Mitsuhashi
patent: 6346713 (2002-02-01), Van Valkenburg
patent: 6437357 (2002-08-01), Weiss et al.
patent: 201 21 763 (2003-06-01), None
patent: 102 21 945 (2003-07-01), None
patent: 99/49303 (1999-09-01), None
Patent Abstracts of Japan, JP 10-339795, Published Dec. 22, 1998.

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