Method and apparatus for detecting diversion

Details Method and apparatus for detecting diversion Method and apparatus for detecting diversion

1986-03-03

1988-05-03

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356372, 356389, 356397, G01B 1127

Patent

active

047416220

ABSTRACT:
A method of detecting a registration diversion between a mask and a wafer prior to a main exposure. This method detects relative diversions between marks on the wafer and latent images of marks on the mask formed on a photosensitive layer of the wafer. The latent images of the marks on the mask are preliminarily formed on the photosensitive layer of the wafer by an exposure energy beam prior to the main exposure.

REFERENCES:
patent: 4640619 (1987-02-01), Edmark

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