Electricity: measuring and testing – A material property using electrostatic phenomenon – For flaw detection
Patent
1986-10-16
1989-02-07
Paschall, M. H.
Electricity: measuring and testing
A material property using electrostatic phenomenon
For flaw detection
324452, G01N 2760
Patent
active
048034355
ABSTRACT:
Small and/or large defects in dielectric materials can be detected by bombarding one surface of the dielectric material with gas ions in order to impart a charge on that surface while the opposite surface is under the influence of an opposite charge. The dielectric material is then exposed to an indicator substance having an affinity for the charge of the gas ions and a tendency to congregate on regions of the dielectric materials which contain defects.
REFERENCES:
patent: 2499467 (1950-03-01), De Forest et al.
patent: 2669692 (1954-02-01), Pearson
patent: 2678420 (1954-05-01), De Forest et al.
patent: 3234462 (1966-02-01), Holdsworth
patent: 4251775 (1981-02-01), Michel
patent: 4443764 (1984-04-01), Suh et al.
patent: 4463316 (1984-07-01), Messins et al.
patent: 4578279 (1986-03-01), Zingher
patent: 4668916 (1987-05-01), Pech
Cochran William W.
Hewlett--Packard Company
Paschall M. H.
Wysocki A. Jonathan
LandOfFree
Method and apparatus for detecting dielectric defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for detecting dielectric defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for detecting dielectric defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1086658