Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2004-11-05
2008-12-09
Turner, Samuel A (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07463350
ABSTRACT:
Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit12, and then defects are detected by a signal processing unit.
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Maeda Shunji
Nishiyama Hidetoshi
Shibata Yukihiro
Yoshida Minoru
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Turner Samuel A
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