Method and apparatus for detecting defects in a pattern

Details Method and apparatus for detecting defects in a pattern Method and apparatus for detecting defects in a pattern

1983-09-20

1986-07-22

Kittle, John E.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

G01N 2147

Patent

active

046015779

ABSTRACT:
A method and apparatus for detecting defects in a pattern are disclosed. The defect detecting method is comprised of a step of dark-field illuminating a patterned object with a directionality and a step for detecting only the defect component by erasing the pattern component in a pattern image formed by the dark-field illumination. The apparatus comprises an illuminating device for dark-field illuminating a patterned object with parallel rays, an image pick-up device for picking up a pattern image, which is disposed just above the pattern, and a data processing circuit for processing the picked up image signal to detect a defect.

REFERENCES:
patent: 3186296 (1965-06-01), Erban
patent: 3658420 (1972-04-01), Axelrod
patent: 4297032 (1981-10-01), Temple

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