Method and apparatus for detecting defective semiconductor wafer

Details Method and apparatus for detecting defective semiconductor wafer Method and apparatus for detecting defective semiconductor wafer

1993-02-23

1995-08-22

Allen, Stephone B.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

25055929, 356237, G01N 2188

Patent

active

054442656

ABSTRACT:
An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process before a large number of semiconductor wafers are ruined. The burnt resist or mask is detected by the lack of reflected light from the surface of the wafer compared with the light reflected from the surface of a known good resist coated wafer.

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