Method and apparatus for detecting and dispersing...

Details Method and apparatus for detecting and dispersing... Method and apparatus for detecting and dispersing...

2006-02-28

2006-02-28

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Abradant supplying

C451S005000, C451S006000, C451S008000, C451S010000, C451S036000, C451S088000, C451S099000, C451S287000, C451S289000, C451S446000, C451S910000

Reexamination Certificate

active

07004824

ABSTRACT:
A method and apparatus of in situ monitoring and dispersing unwanted particles in slurry used during CMP polishing. The method includes providing a slurry path, applying to the slurry path a microcavitation field of a first level to detect particles of a predetermined size, applying to the slurry path a microcavitation field of a second level that is capable of dispersing said particles, and after the second applying step, feeding the slurry to a CMP polishing unit. Particle size may be detected and/or the microcavitation field strength may be set according to particle size. In addition, field strength may be calibrated according to levels determined by polystyrene control particles of a known size and/or concentration. A single or dual transducer may apply the microcavitation.

REFERENCES:
patent: 5895550 (1999-04-01), Andreas
patent: 6592708 (2003-07-01), Vanell

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