Method and apparatus for detecting an IC defect using charged pa

Details Method and apparatus for detecting an IC defect using charged pa Method and apparatus for detecting an IC defect using charged pa

1996-04-30

1998-05-26

Nguyen, Vinh P.

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

324 96, G01R 3128

Patent

active

057571988

ABSTRACT:
Test patterns are applied to an IC under test under a test pattern address by which the first fail is caused and under other test pattern addresses. A defect candidate area is moved to the position where a charged particle beam can scan the area and defect candidate wiring portions are specified. A potential data of the specified wiring is acquired for each of the test patterns and stored in a memory. This process is performed by sequentially stepping back the stop test pattern addresses. Then, a potential data of the specified wiring in the specified area is similarly acquired for non-defect IC. The respective potential data of the IC under test and the non-defect IC are compared to locate the mismatch test pattern address and wiring.

REFERENCES:
patent: 4358732 (1982-11-01), Johnston et al.
patent: 4870344 (1989-09-01), Stille
patent: 5164666 (1992-11-01), Wolfgang et al.
patent: 5391985 (1995-02-01), Henley
patent: 5528156 (1996-06-01), Ueda et al.

Affiliated with

Also associated with

Rating

Method and apparatus for detecting an IC defect using charged pa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for detecting an IC defect using charged pa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for detecting an IC defect using charged pa will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1965869