Method and apparatus for detecting a substrate feature

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S631000, C356S637000

Reexamination Certificate

active

06891629

ABSTRACT:
The invention is directed to a method and apparatus for detecting a substrate feature. A sensor is secured opposite the substrate. The sensor emits a signal onto the surface of the substrate. The sensor detects the amount of signal reflected from the substrate. The sensor is programmed with the relative signal reflective properties for a surface of the substrate. The sensor compares the expected signal reflection rates for a surface of the substrate to the actual signal reflection rate. The sensor generates an output signal to an output device.

REFERENCES:
patent: 4357899 (1982-11-01), Jones et al.
patent: 5745244 (1998-04-01), Svanqvist et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for detecting a substrate feature does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for detecting a substrate feature, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for detecting a substrate feature will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3463174

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.