Method and apparatus for detecting a plasma

Details Method and apparatus for detecting a plasma Method and apparatus for detecting a plasma

2008-01-01

2008-01-01

Moore, Karla (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C118S688000, C118S7230AN

Reexamination Certificate

active

10674920

ABSTRACT:
The present invention presents an improved apparatus and method for monitoring a material processing system, where the material processing system includes a processing tool, test signal source, and a filter/detector. The test signal source providing a first test signal and a second test signal to the processing chamber, and the filter/detector detecting an intermodulation product of the first test signal and the second test signal generated when a plasma is created.

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