Method and apparatus for detecting a crystallographic axis of a

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

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356 31, G01N 23207

Patent

active

051877295

ABSTRACT:
A method and an apparatus for detecting a crystallographic axis of a single crystal ingot based on the X-ray diffractometry, wherein and whereby a crystal habit line of the single crystal ingot is optically detected first, and thereafter making use of the geographical relation of the crystallographic axis to the crystal habit line, the crystallographic axis is detected with improved economy of time and labor and with improved precision, so that the orientation flat (OF) is made in the right place and direction.

REFERENCES:
patent: 4884887 (1989-12-01), Vanderwater

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