X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-02-19
1993-02-16
Hannaher, Constantine
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
356 31, G01N 23207
Patent
active
051877295
ABSTRACT:
A method and an apparatus for detecting a crystallographic axis of a single crystal ingot based on the X-ray diffractometry, wherein and whereby a crystal habit line of the single crystal ingot is optically detected first, and thereafter making use of the geographical relation of the crystallographic axis to the crystal habit line, the crystallographic axis is detected with improved economy of time and labor and with improved precision, so that the orientation flat (OF) is made in the right place and direction.
REFERENCES:
patent: 4884887 (1989-12-01), Vanderwater
Ibe Hiroyaki
Masui Tsumoru
Terashima Seiichi
Hannaher Constantine
Shin-Etsu Handotai & Co., Ltd.
Wong Don
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