Method and apparatus for designing a highly reliable pattern rec

Image analysis – Pattern recognition – Feature extraction

Patent

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Details

382179, 382181, 382182, 382190, 382192, 382199, 382200, 382224, 382259, G06K 946

Patent

active

059405350

ABSTRACT:
A design for a high reliability recognition system utilizes two optimized thresholds for each class k of a prototype data base. One threshold is a class region threshold CR.sub.k and the other is a dis-ambiguity threshold DA.sub.k. CR.sub.k specifies a constrained region belonging to a class k, and DA.sub.k corresponds to a value with which a sample belonging to class k can be correctly recognized with a high level of confidence. During recognition, if the distance D(x, r.sub.M) between an input sample x and the representative prototype r.sub.M of a nearest class M is larger than the class region threshold CR.sub.M, x will be rejected. Furthermore, if the distance D(x, r.sub.M) is subtracted from the distance D(x, r.sub.S) between x and the representative prototype r.sub.S of a second nearest class S, the resulting distance difference must be greater than the dis-ambiguity threshold DA.sub.M, or x will be rejected. An inventive algorithm is used to compute optimum thresholds CR.sub.k and DA.sub.k for each class k. The algorithm is based on minimizing a cost function of a recognition error analysis. Experiments were performed to verify the feasibility and effectiveness of the inventive method.

REFERENCES:
patent: 4989258 (1991-01-01), Takahashi et al.
patent: 5072452 (1991-12-01), Brown et al.
patent: 5319738 (1994-06-01), Shima et al.
patent: 5361379 (1994-11-01), White
patent: 5392363 (1995-02-01), Fujisaki et al.
patent: 5555317 (1996-09-01), Anderson
patent: 5572604 (1996-11-01), Simand

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