Method and apparatus for depositing conducting oxide on a substr

Details Method and apparatus for depositing conducting oxide on a substr Method and apparatus for depositing conducting oxide on a substr

1982-05-12

1984-01-31

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, 204298, C23C 1500

Patent

active

044288107

ABSTRACT:
There is described a method and an apparatus for depositing oxide, such as zinc oxide, on a substrate by R.F. magnetron sputtering. The oxide deposit is "switched" from a non-conducting to a highly conducting material by a second discharge caused by a voltage applied to a screen grid immediately in front of the substrate, or is rendered conducting by a heating step.

REFERENCES:
patent: 3477936 (1969-11-01), Gillery et al.
patent: 3506556 (1970-04-01), Gillery et al.
Hanak, Proc. 6th Internl. Vacuum Cong. 1974, Japan, J. Appl. Phys. Suppl. 2, Part 1, 1974, p. 809.
Dakss et al., IBM Tech. Disc. Bull., Oct. 1970, vol. 13, No. 5, pp. 1176-1178.
Michel et al., IBM Tech. Disc. Bull., vol. 13, No. 5, Oct. 1970, p. 3790.

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