Method and apparatus for depositing coatings in a glow discharge

Details Method and apparatus for depositing coatings in a glow discharge Method and apparatus for depositing coatings in a glow discharge

1981-01-13

1983-07-19

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118 501, 204164, B05C 302, C23C 1100

Patent

active

043944000

ABSTRACT:
A method and apparatus for coating substrates by glow discharge in which the generation of ions and deposition of a coating are controlled independently. A plasma is established inside a chamber by application of either RF or DC voltages to a cathode, e.g., an aluminium cathode. Above the cathode a substrate is held on a substrate holder whose temperature can be controlled independently of the plasma temperature. An electrical bias may be applied to the substrate. Ions in the plasma strike the cathode and a number leave the cathode to strike the substrate and form the required coating. The coating may be hard carbon from a hydro-carbon gas e.g. butane, or silicon from silane gas, or germanium from germane gas. The substrate may be electrically conducting or insulating.

REFERENCES:
patent: 3419487 (1968-12-01), Robbins et al.
patent: 3485666 (1969-12-01), Sterling et al.
patent: 3600218 (1971-08-01), Pennebaker
patent: 3650737 (1972-03-01), Maissel et al.
patent: 3953619 (1976-04-01), Matsubara

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