Method and apparatus for depositing a substance with temperature

Details Method and apparatus for depositing a substance with temperature Method and apparatus for depositing a substance with temperature

1994-11-01

1996-09-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118728, 118730, C23C 1600

Patent

active

055519830

ABSTRACT:
An apparatus for depositing a substance with temperature control includes, in one embodiment: a mandrel rotatable on an axis; a spacer mounted on the mandrel; a substance mounted on the spacer; a plasma, containing constituents of the substance being deposited, directed toward the substrate; the spacer having a thermal conductance in its thickness direction that varies with radial dimension.

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