Method and apparatus for delivering ultra-low particle counts in

Details Method and apparatus for delivering ultra-low particle counts in Method and apparatus for delivering ultra-low particle counts in

1995-12-01

1997-07-29

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

B08B 304

Patent

active

056513798

ABSTRACT:
The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water filter bank, a local gas filtering system, an H.sub.2 O.sub.2 injection unit, an auxiliary chemical injection unit, and a controller for operating the other components. The water filter bank provides a multiple stage filtering system to eliminate particles without a substantial drop in water pressure. The H.sub.2 O.sub.2 injection unit provides a local source of H.sub.2 O.sub.2 to clean the filter and rinser and to provide a mechanism for controlling the formation of native oxide on the wafer during rinsing. The auxiliary chemical injection unit provides a chemical additive to the rinsing unit to enhance the wafer cleaning process. The gas filtering system provides clean gas to the rinsing unit and to the injection units. The clean gas provides a clean atmosphere over the chemicals in each injection unit, and over the water in the rinser.

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Semiconductor International, "Keeping the `RCA` in Wet Chemistry Cleaning", pp. 86-89, Jun. 1994.
Kurt K. Christenson and Shelley M. Smith, "Removing Matallic Contaminants in an RCA-2 Clean as a Function of Blend Ratio and Temperature", pp. 47-53, Microcontamination, Jun. 1994.

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