Specialized metallurgical processes – compositions for use therei – Processes – Producing or treating free metal
Patent
1989-12-27
1991-04-30
Kastler, S.
Specialized metallurgical processes, compositions for use therei
Processes
Producing or treating free metal
266209, C21C 700
Patent
active
050115316
ABSTRACT:
A method and apparatus for vacuum degassing blows gas into molten metal so as to form a substantially uniformly distributed bubble over the path area defined by an induction pipe. In order to achieve this, discharge nozzles are separated into at least two groups. The pressures of the gases discharged through the discharge nozzles in different groups are controlled independently of the other so that gas blown through a first group of nozzles forms bubbles at around the central portion of the induction pipe and the pressure of the gas blown through the other group of nozzles is adjusted for forming the bubbles in the vicinity of the periphery of the induction pipe.
REFERENCES:
patent: 3042510 (1962-07-01), Armbruster et al.
patent: 3310850 (1967-03-01), Armbruster
patent: 3320053 (1967-05-01), Lehman
patent: 3367396 (1968-02-01), Sickbert et al.
patent: 3607228 (1971-09-01), Todd
Patent Abstracts of Japan, vol. 9, No. 74(C-273) & JP-A-59 208011 26-11-84.
Patent Abstracts of Japan, vol. 7, No. 83(C-160 & JP-A-58 11721 22-01-83.
Patent Abstracts of Japan, vol. 10, No. 23 (C-325) & JP-A-60 177122 11-9-85.
Ikeda Ryuichi
Kojima Shinji
Ohmiya Shigeru
Okuda Haruji
Takahashi Kiyoshi
Kastler S.
Kawasaki Steel Corporation
Miller Austin R.
LandOfFree
Method and apparatus for degassing molten metal utilizing RH met does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for degassing molten metal utilizing RH met, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for degassing molten metal utilizing RH met will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-638406