Method and apparatus for defect detection

Details Method and apparatus for defect detection Method and apparatus for defect detection

2006-03-21

2006-03-21

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Reexamination Certificate

active

07016028

ABSTRACT:
A method for determining the presence of defects in a covering layer overlying an underlying layer in accordance with an embodiment of the invention comprises providing a substrate comprising the covering layer, where the covering layer is at least partially exposed. The covering layer is subjected to a first substance, such as a solvent, and then subjected to a light beam. An optical property of the covering layer is determined and compared with a threshold value. The presence of defects in the covering layer is determined by the difference of the optical property from the threshold value, where the optical property indicates a level of penetration of the first substance through the covering layer.

REFERENCES:
patent: 4314474 (1982-02-01), Dermarderosian
patent: 2001/0030296 (2001-10-01), Ishimaru et al.
patent: 1516884 (1968-02-01), None
patent: WO 00/12999 (2000-03-01), None
“Wafer Level Detection of Sealing Defects,” Quoc Toan Le, Frank Holsteyns, Francesca Iocopi, and Karen Maex, Abstract submitted for a presentation at the MRS Spring 2003 conference held Apr. 21-25, 2003.
European Search Report for Application No. 03447145.8-1524—dated Oct. 18, 20004.

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