Method and apparatus for creation of resist patterns by chemical

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

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430325, G03C 500, G03F 730

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active

051943506

ABSTRACT:
Creation of a resist pattern through chemical development of a resist layer which has been subjected to a patternmaking process such as selective exposure to electromagnetic rays or drawing with an electron beam. A workpiece, having the resist layer formed on an electroconductive surface of a substrate, is dipped in a bath of developing liquid at a first temperature. During the progress of the development the magnitude of an electric current flowing between the conductive surface of the workpiece and an electrode also immersed in the bath is constantly monitored in order to determine a moment at which the withdrawal of the developing liquid from the vessel is to be commenced. Upon commencement of the liquid withdrawal from the vessel, an additional amount of developing liquid is charged into the vessel at a second temperature lower than the first temperature. The progress of development during the liquid withdrawal is thus retarded in order to assure a sufficient length of time for the recovery of the used liquid for recirculation.

REFERENCES:
patent: 4755442 (1988-07-01), Hasebe et al.

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