Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2007-10-09
2007-10-09
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S002000, C216S017000, C216S019000, C216S041000, C216S058000, C216S066000
Reexamination Certificate
active
11020138
ABSTRACT:
A method and apparatus for patterning an array of SLM mirrors with a phase step is disclosed. Additional embodiments of the present invention describe a method for processing a substrate, wherein the processed substrate is used in the apparatus for patterning an array of SLM mirrors with a phase step. The processed substrate is then placed in close proximity to the mirrors and the etching/deposition process is then done through openings in the substrate. In embodiments in which the processed substrate does not have a high enough density of openings, a stepping and repeating process is used in order to achieve complete process coverage of every mirror in an array of SLM mirrors.
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Ahmed Shamim
ASML Holding N.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
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