Optical: systems and elements – Single channel simultaneously to or from plural channels – By partial reflection at beam splitting or combining surface
Reexamination Certificate
2006-02-09
2008-08-05
Spector, David N (Department: 2873)
Optical: systems and elements
Single channel simultaneously to or from plural channels
By partial reflection at beam splitting or combining surface
C359S618000, C359S639000
Reexamination Certificate
active
07408714
ABSTRACT:
In a photomask projection system, a photomask mask is illuminated by light from two lasers. A beam from one of the lasers is mixed with a beam from the other laser to provide two mixed beams each containing of portion of the beams from both lasers. The mixed beams are directed at an angle to each other and intersect on the photomask.
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Simon Frank
Windpassinger Roman
Coherent Inc.
Spector David N
Stallman & Pollock LLP
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