Method and apparatus for coupling a pellicle assembly to a...

Details Method and apparatus for coupling a pellicle assembly to a... Method and apparatus for coupling a pellicle assembly to a...

2005-01-11

2005-01-11

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C355S075000, C428S014000

Reexamination Certificate

active

06841312

ABSTRACT:
A method and apparatus for coupling a pellicle assembly to a photomask are disclosed. A pellicle assembly is mounted on a photomask by bringing an adhesive material formed on a surface of a frame associated with the pellicle assembly in contact with the photomask. The adhesive material is heated to cause the adhesive gasket to flow and comply with a flatness of the photomask.

REFERENCES:
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patent: 5616927 (1997-04-01), Kubota et al.
patent: 5693382 (1997-12-01), Hamada et al.
patent: 5723860 (1998-03-01), Hamada et al.
patent: 5772842 (1998-06-01), Tanaka et al.
patent: 5976307 (1999-11-01), Cook, Jr.
patent: 6103427 (2000-08-01), Storm
patent: 6264773 (2001-07-01), Cerio
Pending U.S. patent application Ser. No. 10/072,204 entitled “Method and Apparatus for Coupling a Pellicle to a Photomask Using a Non-Distorting Mechanism” filed Feb. 7, 2002 by Joseph S. Gordon et al. (Docket No. 064441.0227).

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