Method and apparatus for correcting transparent defects on a pho

Details Method and apparatus for correcting transparent defects on a pho Method and apparatus for correcting transparent defects on a pho

1982-01-12

1984-04-24

Lusignan, Michael R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

219121LM, 346 76L, 346108, 427 531, 427 541, 427142, B23K 900, B05D 306, G01D 1510, G01D 942

Patent

active

044448015

ABSTRACT:
A method and apparatus for correcting transparent defects on a photomask are disclosed. A metal-organic complex solution is applied to a transparent defect portion and its periphery on the photomask. The transparent defect portion is then exposed to a visible ray or ultraviolet ray to deposit a metal, a metal oxide or a composition thereof, while the light transmission quantity through the transparent defect portion is measured. After the measurement falls below a predetermined level relative to the quantity of the transmitted light at the start of exposure, the exposure is terminated to thereby complete the correction of the transparent defects.

REFERENCES:
patent: 4190759 (1980-02-01), Hongo et al.
patent: 4200668 (1980-04-01), Segal et al.
patent: 4256778 (1981-05-01), Mizukami et al.

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