Method and apparatus for controlling the thickness distribution

Details Method and apparatus for controlling the thickness distribution Method and apparatus for controlling the thickness distribution

1990-04-02

1991-01-08

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118720, 118730, C23C 1600

Patent

active

049826956

ABSTRACT:
The thickness distribution of a vapor deposited layer such as an interference filter having deposited on a moving substrate such as a glass faceplate for a projection television tube, is controlled along an axis in the direction of travel of the substrate by employing at least one rotatable dodger to partially shield the substrate as it passes behind the dodger during deposition.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen et al.
patent: 3664295 (1972-05-01), Ng et al.
Fowler, A. B. and D. R. Young, "Apparatus for Evaporating Thin Coatings with In Situ Control of Thickness", IBM Tech. Dis. Bul., vol. 20, No. 7 (Dec. 1977), pp. 2876-2877.

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