Method and apparatus for controlling the temperature of a radian

Details Method and apparatus for controlling the temperature of a radian Method and apparatus for controlling the temperature of a radian

1986-11-18

1988-08-02

Paschall, M. H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

219505, 219494, 219358, 340588, 307117, H05B 102

Patent

active

047615389

ABSTRACT:
A temperature control signal (S.sub.1) responsive to a target temperature is biquadrated (S.sub.1.sup.4) to produce a power control signal. A power supply unit supplies electric power to one or more radiant heat sources on the basis of the power control signal, whereby an object such as, for example, a wafer is heated by radiant energy from the one or more radiant heat sources. The wafer temperature is proportional to the biquadrative root of the radiant energy in accordance with the well-known Stefan-Boltzmann's law, whereby the wafer temperature correctly follows a predetermined time-dependent target temperature variation over time.

REFERENCES:
patent: 4300037 (1981-11-01), Padden
patent: 4340807 (1982-07-01), Raskin et al.
patent: 4377739 (1983-03-01), Eckert, Jr. et al.
patent: 4551007 (1985-11-01), Elter
patent: 4570054 (1986-02-01), Chigzey et al.

Affiliated with

Also associated with

Rating

Method and apparatus for controlling the temperature of a radian does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for controlling the temperature of a radian, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for controlling the temperature of a radian will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-712860