Method and apparatus for controlling the removal, by means of io

Details Method and apparatus for controlling the removal, by means of io Method and apparatus for controlling the removal, by means of io

1977-01-28

1978-04-18

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156643, 219121EM, 219121P, 204298, C23C 1500

Patent

active

040850226

ABSTRACT:
A method for controlling the removal, by means of ion etching, of a thin layer or regions of the layer as determined by masks, from a substrate of a sample which has a chemical composition different than that of the layer to be removed. During the ion etching process, an electrical signal which changes after the removal of the thin layer is derived from the substrate or from its mount, or from an electrode disposed in the vicinity of said substrate and this electrical signal is utilized to control an arrangement which influences the ion bombardment of the surface of the sample.

REFERENCES:
patent: 3528387 (1970-09-01), Hamilton
patent: 3664942 (1972-05-01), Havas et al.
D. J. Barber, "Thin Foils of Non-Metals Made for Electron Microscopy by Sputter-Etching," J. Mat. Sci., vol. 5, (pp. 1-8), (1970).

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