Method and apparatus for controlling the deposition of films by

Details Method and apparatus for controlling the deposition of films by Method and apparatus for controlling the deposition of films by

1977-11-03

1978-11-07

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192P, 204298, C23C 1500

Patent

active

041244745

ABSTRACT:
The method consists in establishing the ion bombardment parameters, in varying a regulation parameter in order to initiate deposition, in measuring at each instant the total pressure drop within the vacuum chamber with respect to the initial pressure and in controlling the total pressure drop by controllably varying the regulation parameter.

REFERENCES:
patent: 3761375 (1973-09-01), Pierce et al.
patent: 3907660 (1975-09-01), Gillery
patent: 3962062 (1976-06-01), Ingrey
patent: 4043889 (1977-08-01), Kochel
patent: 4065600 (1977-12-01), King et al.

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