Method and apparatus for controllably effecting samples...

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S441000, C204S602000

Reexamination Certificate

active

06967489

ABSTRACT:
Methods and systems for effecting a parameter and detecting a parameter using two electric signal in a conductive path are described.

REFERENCES:
patent: 4947468 (1990-08-01), Nelson
patent: 5455513 (1995-10-01), Brown et al.
patent: 5589047 (1996-12-01), Coster et al.
patent: 5644239 (1997-07-01), Huang et al.
patent: 5779868 (1998-07-01), Parce et al.
patent: 5800690 (1998-09-01), Chow et al.
patent: 5942443 (1999-08-01), Parce et al.
patent: 5965001 (1999-10-01), Chow et al.
patent: 5965410 (1999-10-01), Chow et al.
patent: 6132580 (2000-10-01), Mathies et al.
patent: 6143152 (2000-11-01), Simpson et al.
patent: 6150107 (2000-11-01), Glazer et al.
patent: 6171850 (2001-01-01), Nagle et al.
patent: 6261431 (2001-07-01), Mathies et al.
patent: 6284525 (2001-09-01), Mathies et al.
patent: 6306590 (2001-10-01), Mehta et al.
patent: 6437551 (2002-08-01), Krulevitch et al.
patent: 6448794 (2002-09-01), Cheng et al.
patent: 6750661 (2004-06-01), Brooks et al.
Manz, A. et al.,Trends in Anal. Chem. (1990) 10(5):144-149.
Manz, A. et al.,Adv. in Chromatog. (1993) 33:1-66.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for controllably effecting samples... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for controllably effecting samples..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for controllably effecting samples... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3497948

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.