Method and apparatus for control of layer thicknesses

Details Method and apparatus for control of layer thicknesses Method and apparatus for control of layer thicknesses

2003-12-02

2011-11-22

Jolley, Kirsten (Department: 1715)

Coating processes

Centrifugal force utilized

C427S542000, C427S557000, C427S377000, C427S398400, C427S425000, C118S642000, C118S052000, C118S058000, C118S069000, C118S320000

Reexamination Certificate

active

08062705

ABSTRACT:
It is shown a method and apparatus for distributing a viscous liquid over a surface of a substrate, e.g. a semiconductor wafer or a datastorage media, by conditioning the substrate thermally, locally specific before or during the spin coating process.

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