Method and apparatus for continuously forming functional deposit

Details Method and apparatus for continuously forming functional deposit Method and apparatus for continuously forming functional deposit

1995-04-21

1996-06-18

Nguyen, Nam

Coating apparatus

Gas or vapor deposition

Multizone chamber

118718, 118723MW, 118213ME, C23C 1600

Patent

active

055273912

ABSTRACT:
An apparatus for continuously forming a functional deposited film with a large area according to a microwave plasma CVD process is described. The apparatus comprises the elements of a continuous traveling band-shaped member containing a conductive member along its length during which a pillar-shaped film-forming space capable of being kept substantially in vacuum therein is established by the use of the traveling band-shaped member as a side wall for the film-forming space, charging starting gases for film formation through a gas feed means into the film-forming space, and simultaneously radiating a microwave through a microwave antenna in all directions vertical to the direction of movement of the microwave so that microwave power is supplied to the film-forming space to initiate a plasma in the space whereby the film is deposited on the surface of the continuously traveling band-shaped member which constitutes the side wall exposed to the plasma.

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patent: 4995341 (1991-02-01), Matsuyama
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Translation of Japanese Application JP 61288074.

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